Pure and Applied Chemistry, 1988, Volume 60, No. 5, pp. 633-644, Other PAC articles by these authors

PAC → Archive → Vol. 60 (1988) → Issue 5 → Plasma deposition of amorphous silicon… → Other PAC articles by these authors

Pure Appl. Chem., 1988, Vol. 60, No. 5, pp. 633-644

http://dx.doi.org/10.1351/pac198860050633

Plasma deposition of amorphous silicon films: an overview on some open questions

P. Capezzuto and G. Bruno

M. Losurdo, P. Capezzuto and G. Bruno

Plasmasurface interactions in the processing of iiiv semiconductor materials

G. Cicala, G. Bruno and P. Capezzuto

Plasma deposition of amorphous silicon alloys from fluorinated gases

G. Bruno, P. Capezzuto and G. Cicala

Novel approaches to plasma deposition of amorphous silicon-based materials

R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa

Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges