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Pure Appl. Chem., 1992, Vol. 64, No. 5, pp. 703-707

http://dx.doi.org/10.1351/pac199264050703

Chemistry of titanium dry etching in fluorinated and chlorinated gases

F. Fracassi and R. d’Agostino

Individual author index pages

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A. Milella, F. Palumbo, P. Favia, G. Cicala and R. d’Agostino
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R. Lamendola and R. d’Agostino
Process control of organosilicon plasmas for barrier film preparations
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P. Favia, R. d’Agostino and F. Fracassi
Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
1994, Vol. 66, Issue 6, pp. 1373-1380 [Details] [Full text - pdf 534 kB]
R. d’Agostino, F. Fracassi and R. Lamendola
The chemistry of etching and deposition processes
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R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa
Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
1985, Vol. 57, Issue 9, pp. 1287-1298 [Details] [Full text - pdf 210 kB]