Pure and Applied Chemistry, 1992, Volume 64, No. 5, pp. 725-730, Other PAC articles by these authors

PAC → Archive → Vol. 64 (1992) → Issue 5 → Novel approaches to plasma deposition… → Other PAC articles by these authors

Pure Appl. Chem., 1992, Vol. 64, No. 5, pp. 725-730

http://dx.doi.org/10.1351/pac199264050725

Novel approaches to plasma deposition of amorphous silicon-based materials

G. Bruno, P. Capezzuto and G. Cicala

A. Milella, F. Palumbo, P. Favia, G. Cicala and R. d’Agostino

Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges

M. Losurdo, P. Capezzuto and G. Bruno

Plasmasurface interactions in the processing of iiiv semiconductor materials

G. Cicala, G. Bruno and P. Capezzuto

Plasma deposition of amorphous silicon alloys from fluorinated gases

P. Capezzuto and G. Bruno

Plasma deposition of amorphous silicon films: an overview on some open questions

R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa

Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges