Pure and Applied Chemistry, 1994, Volume 66, No. 6, pp. 1185-1193, Other PAC articles by these authors

Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1185-1193

http://dx.doi.org/10.1351/pac199466061185

The chemistry of etching and deposition processes

R. d’Agostino, F. Fracassi and R. Lamendola

A. Milella, F. Palumbo, P. Favia, G. Cicala and R. d’Agostino

Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges

R. Lamendola and R. d’Agostino

Process control of organosilicon plasmas for barrier film preparations

P. Favia, R. d’Agostino and F. Fracassi

Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers

F. Fracassi and R. d’Agostino

Chemistry of titanium dry etching in fluorinated and chlorinated gases

R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa

Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges