Pure Appl. Chem., 2005, Vol. 77, No. 2, pp. 399-414
http://dx.doi.org/10.1351/pac200577020399
Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges
Individual author index pages
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Process control of organosilicon plasmas for barrier film preparations
        
        Plasma deposition of amorphous silicon alloys from fluorinated gases
        
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        The chemistry of etching and deposition processes
        
        Novel approaches to plasma deposition of amorphous silicon-based materials
        
        Chemistry of titanium dry etching in fluorinated and chlorinated gases
        
        Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
        
        