Pure and Applied Chemistry, Articles of P. Capezzuto

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M. Losurdo, P. Capezzuto and G. Bruno

Plasmasurface interactions in the processing of iiiv semiconductor materials

1998, Vol. 70, Issue 6, pp. 1181-1186 [Details] [Full text - pdf 553 kB]
G. Cicala, G. Bruno and P. Capezzuto

Plasma deposition of amorphous silicon alloys from fluorinated gases

1996, Vol. 68, Issue 5, pp. 1143-1149 [Details] [Full text - pdf 619 kB]
G. Bruno, P. Capezzuto and G. Cicala

Novel approaches to plasma deposition of amorphous silicon-based materials

1992, Vol. 64, Issue 5, pp. 725-730 [Details] [Full text - pdf 537 kB]
P. Capezzuto and G. Bruno

Plasma deposition of amorphous silicon films: an overview on some open questions

1988, Vol. 60, Issue 5, pp. 633-644 [Details] [Full text - pdf 783 kB]
R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa

Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges

1985, Vol. 57, Issue 9, pp. 1287-1298 [Details] [Full text - pdf 210 kB]