Author detail
Articles by R. d’Agostino
- Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges
 - Process control of organosilicon plasmas for barrier film preparations
 - Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
 - The chemistry of etching and deposition processes
 - Chemistry of titanium dry etching in fluorinated and chlorinated gases
 - Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
 
Coauthors
- F. Fracassi (3 articles)
 - R. Lamendola (2 articles)
 - P. Favia (2 articles)
 - P. Capezzuto (1 article)
 - G. Bruno (1 article)
 - F. Cramarossa (1 article)
 - A. Milella (1 article)
 - F. Palumbo (1 article)
 - G. Cicala (1 article)
 
Affiliations
- Dipartimento di Chimica, Università degli Studi di Bari, via Orabona 4, 70126 Bari, Italy
 
